CleanRooms China and Product Display 2006 sees high attendance
By Simon Lian, Editor-in-Chief, CleanRooms China
The CleanRooms China Conference and Product Display 2006, organized by CleanRooms China magazine, took place September 20-21, 2006, at Shanghai’s Riverfront Business Hotel. More than 250 attendees convened for the networking event, where the latest technologies and services were presented by more than 20 industry players, including Hach Ultra, CESSTECH, Janapo, Toyo Lint, Camfil Farr, Lighthouse, NATop (SH) Information Technology, Via Trade, HENSON, EDRI, SEEDRI, SEPIA, M+W Zander, Testo AG, DuPont China Holding Co., United Integrated Services Co. and IAQ.
More than 250 contamination control professionals attended the seminar.
Fourteen speakers introduced and discussed recent developments in cleanroom technology. Chen Yi of Hach Ultra explored the topic of selecting sample points for airborne particle counting in cleanrooms; Peter Maguire, VP of Asia Pacific Sales for Lighthouse Worldwide Solutions, spoke about baseline, routine monitoring and measuring of ESD and AMC control, and also lectured on the fundamentals of contamination control and particle counting; Edward Zhao, molecular filtration engineer for Camfil Farr, focused on securing an AMC-free environment for sub-30 nm fabs; and Stone Ni, ITS manager for NATop (SH) Information Technology Co., introduced the company’s new liquid leakage detection technology and explained its application in cleanrooms.
CleanRooms China and Product Display 2007 will be held next September in Shanghai, China.