Veeco receives orders for four R&D MBE systems

Nov. 28, 2006 — Veeco Instruments Inc. announced that it has received four orders for its R&D Molecular Beam Epitaxy (MBE) systems. The orders extend across the Veeco R&D product line including a GEN20, GEN930, GEN II, and GEN III.

The systems ordered are planned for a wide-range of development efforts at leading research groups in Europe, Japan, and the United States. The GEN20, the latest development platform addition to the product line, will manufacture quantum dots.

Similar to other successful systems operating in oxides, the GEN930 will support a leading institute in the development of next generation logic devices. The GEN II and GEN III systems will support III-V and high mobility developments, respectively.

“These orders show the breadth of our R&D MBE systems for a diverse set of applications from traditional III-V materials to oxides and quantum dots,” said Jeffrey Hohn, vice president, general manager, Veeco MBE operations, in a prepared statement. “The GEN20 system order further solidifies the success of this product as a scalable platform from development through pilot production.”

The GEN20 MBE system is a 4-inch system that can be upgraded from a manual wafer transfer configuration to a system with an automated cluster tool, enabling 24×7 operation.

The company says the flexibility of the pumping configuration, wafer handling options and high wafer throughput make it an excellent choice for government labs and pilot production environments. Veeco says the continued development and advancement of the GEN II and GEN III systems, with their large installed base and proven track record, for high mobility devices and general III-V research make them a natural selection for these applications. The GEN930 configured for oxides is intended as a powerful, and affordable system for emerging oxide applications.


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