Compiled by Carrie Meadows
HCl gas purifiers
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Pall has recently added new HCl gas purifier assemblies to its line of purification products. These purifiers, which incorporate the company’s new HCLP purification medium, have been successfully installed in a variety of applications including bulk delivery systems, gas cabinets, and Epi-CVD equipment. The new medium contains a reactive metal on an inorganic substrate. It can remove moisture to <15 ppb in HCl service at ambient temperature. The ability of the purifier to operate at ambient temperature eliminates the need for a heat source, thereby lowering the cost of ownership for the process owner. The HCLP medium is available in all standard purifier assembly configurations for process flow rates up to 1,000 standard liters per minute (slpm).
Pall Corp.
East Hills NY
www.pall.com
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