CC experts share real-world experiences
02/01/2006
By Angela Godwin
Procedures and protocol are important and necessary, but gathering information and advice from experienced peers is priceless. That’s exactly the thinking behind the new Practical Solutions to Cleanroom Problems conference sessions in this year’s Contamination Control Technology (CCT) Conference and Exhibition this March in Boston.
The sessions, which are part of the Cleanroom Management and Maintenance track taking place on Thursday, March 16, will explore real-world examples of common, costly pitfalls in contamination-control management and the corrective actions that were taken. Richard Matthews, president of Filtration Technology, will co-chair the track, along with David Brande of Contamination Control Technologies. “Our goal is to give attendees the information and insight they need to prevent costly mistakes. It will be an opportunity for them to benefit from the combined knowledge of our six experienced experts in a free, open-discussion atmosphere,” says Matthews.
General topics to be discussed include the value of good communication and the need for strong management on contamination-control issues. Presenters will also discuss specific issues, such as choice of garments, equipment accessibility, and regulatory trip wires in real-world situations within the semiconductor, pharmaceutical and medical device industries. “These important sessions will be of tremendous benefit to contamination-control professionals, helping them manage their cleanroom operations more effectively,” says Kathy Miscioscio, representing Contec.
The sessions are also relevant to a very broad audience, emphasizes Matthews. “Anyone involved in the design, construction and operation of a cleanroom-including general management, process personnel, maintenance vendors and end users of products manufactured in clean spaces-can benefit from this program.”
For more information on this session and the entire CCT Conference and Exhibition, visit www.cleanroomsconferences.com.