The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of the second annual eBeam Initiative survey.  Twenty-eight member companies from across the photomask supply chain participated in the survey.  Participants provided their opinions on a variety of topics critical to advanced photomask production, including the implementation of multibeam mask writing, mask write times at the 10nm node, adoption of eight-inch and larger photomasks, the future of EUV lithography, and the adoption of general purpose graphics processing unit (GPGPU) solutions for simulation-intensive electronic design automation (EDA) applications.  The complete results of the survey will be presented on September 10 during the eBeam Initiative’s annual members meeting at the SPIE Photomask Technology Conference in Monterey, Calif. Read More