Particle contamination control system
HIAC/ROYCO, a division of Pacific Scientific Company, introduces the In- Situ Chemical Particle Monitoring System, developed exclusively for critical wet-etching and wafer cleaning processes. It is the first compact particle-monitoring system for continuously measuring particles at various points within automated wet process stations. Particle levels as small as 0.1 microns can be measured in wafer baths of any semiconductor process chemicals and cleaning solutions. Included in the system is the particle sensor called the MicroCount, the PM-250 Electronic Controller, and chemical sampling hardware.
HIAC/ROYCO, Silver Spring, MD (800) 638-2790