Pall Ultrafine Filtration Co.`s Microelectronics Group has developed prewet filters for use with high purity chemicals in semiconductor fabrication processes. The Super-Cheminert and Ulti-Cheminert Filters can be installed in bulk, distribution and point-of-use applications without prewetting the filters using low surface tension solvents. The prewet filter cartridge option was designed to eliminate the need to IPA-soak hydrophobic membrane filters, according to the company, and thereby minimize environmental exposure to prewetted fluids. The new filters feature low extractable levels and do not require antistats or surfactants. They will rinse up to 18 Megohm resistivity in DI water, as well as single-digit ppb TOC levels, in 30 minutes or less.
Pall Ultrafine Filtration Co., Port Washington, NY