Point-of-use chemical purifier
Millipore has developed point-of-use chemical purification technology for wet chemical cleans in semiconductor manufacturing. The Chempure DHF purifier is the first of a family of chemical purifiers to meet the specific performance requirements for point-of-use purification of metallic contamination in wafer clean processes. The new device is designed to help maintain the purity and stability of DHF baths. Used in the recirculation loop of the baths, Chempure is installed upstream of the particle filter and downstream of the pump. It uses a proprietary resin-based, ion-exchange membrane to significantly reduce (90 percent in just five minutes) ionic contamination such as copper, iron, nickel and zinc. It continuously cleans the bath, keeping metallic ions low and stable over time and preventing ionic spikes and excursions.