ZYRON 116 comes on-line

ZYRON 116 comes on-line

Deepwater, NJ–DuPont has announced the successful startup of its new plant for the production of ZYRON 116 (C2F6) electronic gas. The new plant is operating at design rates and is routinely producing high purity gas (>99.999 percent pure) to meet the needs of the high purity hexafluoroethane needs of the semiconductor market. With the addition of this multi-million dollar plant, located at the company`s Chambers Works facility, DuPont doubles its capacity to produce the gas.

ZYRON 116 is used as a chamber cleaning gas in oxide and selected metal CVD processes, as well as an etchant gas in several plasma process tools. The plant is equipped with in-line gas quality monitoring capabilities and state-of-the-art distributed process control systems. The plant also employs advanced technology to eliminate PFC emissions during production.

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