Bruce Technologies International announces the addition of the BDF-40 to its horizontal furnace product line. The BDF-40 is designed specifically for small-to-medium size semiconductor manufacturers and R&D labs. It performs atmospheric and LPCVD films on 125-mm and 150-mm silicon wafers in batches as large as 200 wafers per load at a temperature range from 400 to 1,350C.
The furnace contains four separate process chambers packaged in a small system footprint. Its three zone elements are controlled by Bruce`s new Model 7353H controller. Compatible with Bruce`s APEX software supervisory system, the BDF-40 can accommodate a cantilever boatloader design for reduced particle generation, a source cabinet that includes easy quartz removal, and a vertical gas system layout for easy component accessibility.
Bruce Technologies International, Inc.
North Billerica, MA