Chip Express opens 8-in. fab line

Santa Clara, CA — Chip Express Corp. has opened its 8-in. fabrication facility that adds 37,000 ft2 to its OneMask ASIC production. The facility`s new Class 10 cleanroom production area is almost 10 times larger than the old cleanroom and is designed for deep submicron processes. The OneMask facility is equipped with RIE-Etching machines, CVD for passivation and an assembly room for packaging. Recently, the company acquired an E-Beam photolithography system for the new facility. Expansion was prompted by an increase of over 300 percent in annual revenue during 1995 for OneMask flexible production and subsequent company growth. The ASIC production devices processed by the OneMask can be delivered in as little as one week. Flexible production volumes or early production quantities are available using the OneMask operation, which customizes a single wafer at a time, using a single-mask, single-etch process.