Filter assemblies for CMP

Filter assemblies for CMP

Pall Corp.`s Microelectronics Division is now offering the CMP Kleen-Change 100 filter assembly series for the filtration of metal and oxide CMP (chemical/ mechanical polishing) slurries. The CMP Kleen-Change 100 series is a range of completely encapsulated, disposable polypropylene filter units designed to eliminate filter housing cleaning, reduce potential contamination and minimize contact with the process slurry.

Assemblies can be readily installed at mixing stations, in distribution loops and at polishing tools. Assemblies contain a polypropylene filter medium available in a range of 5 to 120 micron absolute rating, and a variety of assembly sizes to ensure optimum contaminant removal in specific polishing applications. the filter element is permanently sealed within each assembly, eliminating errors due to incorrect fitting of cartridges and seals.

Pall Corp., Port Washington, NY

(800) 289-7255

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