Interlab`s Rinser/Dryer safely handles wafers up to 300 mm, protecting delicate substrates from breakage, because they are processed in a “no-moving-parts” environment. The heated DI rinse stage is followed by a capillary drying method that quickly removes rinse water from sensitive wafer surfaces. The company`s MicroDry patented HEPA-filtered evaporative dryer finishes the drying in a critically clean, particle-free nitrogen environment. Design features include a proprietary on-board DI regeneration loop for energy, resource and media conservation. The dryer`s automated sliding cover can be push-button-controlled for manual operation or interfaced with control systems in automated applications. Fully compatible with manual and automated applications, these rinse/dryers are available as compact consoles, which can be added to existing wet benches, replace existing dryers, or be built into Interlab`s wet chemistry processing systems.
Interlab Inc., Danbury, CT