GaSonics receives sub-0.25 micron qual for PEP 3510C system

GaSonics receives sub-0.25 micron qual for PEP 3510C system

San Jose, CA

GaSonics International`s Performance Enhancement Platform (PEP) 3510C system for advanced post-etch residue removal applications has been qualified by Motorola`s Advanced Product Research and Development Lab (APRDL) in Austin, TX, for sub-0.25 micron CMOS technology. The effort was the result of a joint GaSonics/ Motorola project to determine the feasibility of the PEP 3510C system for advanced post-etch residue removal applications, including post-polysilicon and post-metal etch residue removal, and high-dose ion implant processing. GaSonics reports that tests of residue removal after polysilicon etch achieved oxide loss of ( 20 (. Tests after post-metal etch residue removal demonstrated total cleanup, with no degradation of electrical performance and no damage. Results obtained after high dose implant demonstrated similar success. — SES

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