Cleaning system

Cleaning system

A CMP cleaning system designed for integration with CMP polishers is now available for OnTrak Systems. Combining mechanical scrubbing and in-situ chemical etching in one system, the Synergy Integra uses a one-step cleaning approach. The unit reduces transfer time between polish and clean steps with a direct single-wafer load and unload. This method prevents cross-contamination during the wafer transfer process and optimizes footprint for the clean and polish combination. The system offers high-purity chemical capability, hydrofluoric compatibility and in-situ chemical etch capability, making it suitable for a number of critical CMP cleaning applications, including interlevel and intermetal dielectric, tungsten and shallow trench isolation.

OnTrak Systems, Inc.

San Jose, CA

(408) 577-1010


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