New technology reduces contamination in hydrogen production

Wayne, PA

Johnson Matthey and Air Products and Chemicals Inc. have jointly developed a palladium membrane diffusion technology that the companies claim virtually eliminates carbon monoxide, carbon dioxide and methane contamination in hydrogen gas, which is used in semiconductor manufacturing applications and can hinder device performance. The technology employs a methanation catalyst that converts the carbon monoxide and carbon dioxide to methane, allowing the palladium membrane to easily separate the chemical from the hydrogen. Officials of Air Products believe the technology will facilitate the use of ultra-high purity hydrogen in locations where commercially available hydrogen sources contain relatively high levels of contaminants. The two companies filed for a joint patent on the technology, which will initially be used by Air Products in major semiconductor manufacturing projects in the Pacific Rim. — TGW