The Evergreen Model 200 double-sided scrubber incorporates double-brush technology to provide the semiconductor-grade cleaning required for preparation of epitaxial wafers. It is suited for initial clean and post-CMP and prediffusion cleaning on smaller substrates down to 1.5 inches in diameter. The double-brush system is complemented by high pressure scrub, a 1.5 MHz megasonic rinse, and precision robotics. Process parameters are under full digital control, driven by a PC with a Windows touch screen interface.
Solid State Equipment Corp.