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Eaton Semiconductor opened an 80,000-sq. ft. clean facility that will produce high energy, medium- to high-current ion implantation equipment using both Class 10,000 and a Class 1000 areas. The Beverly, MA-based division of Eaton Corp. invested $12.3 million to build the new facility, bringing this site's total cleanroom square footage to 263,000.
Enough steel was used in the facility to make a 20-gauge wire circumvent the globe; 30 miles worth of electrical cable were used; and if collected, the air particles in the facility would fit into a 1/16-sq. in. cube.—LMN