SVG’s Micrascan Lithography Platform Designed to Convert From 248 NM to 157 NM

WILTON, CONN—May 11, 2000—Semiconductor manufacturers can now use one platform as they convert to 300 mm with a product designed to evolve lithography from 248 nm to 193 nm to 157 nm. Silicon Valley Group's Micrascan supports a variety of optical trains accommodating the adjustment in technology without requiring changes in tools or in the fab itself, says a company official.

By Stephanie Levy


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.