SEOUL, South Korea—June 22, 2000—Hyundai Electronics has developed an argon fluoride (ArF) photoresist technology that the company says will support 0.09 µm production.
By pennNET Staff
SEOUL, South Korea—June 22, 2000—Hyundai Electronics has developed an argon fluoride (ArF) photoresist technology that the company says will support 0.09 µm production.
By pennNET Staff
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