New Offerings From KLA-Tencor’s Tackle Metrology Needs for 0.13-Micron, 300-mm Production

SAN JOSE, Calif.—June 30, 2000—KLA-Tencor Corp. has introduced a new generation of in-line CD scanning electron microscopes (SEMs) for next-generation lithography and etch applications. The tools are designed for use as a fab transitions to 0.13-µm node and 300-mm manufacturing.

By pennNET Staff


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