Photronics and ASML to Develop Reticles for 0.10-Micron Imaging Technologies

JUPITER, FL—June 20, 2000—Photronics and ASML are developing reticles for 0.10-µm imaging technologies. The reticles will be used to evaluate wafer results on both 248 nanometer and 193 nanometer ASML systems. Photronics, ASML, and IMEC will collect data on both the reticles and the lithography systems. ASML MaskTools is also included in this endeavor.

By pennNET Staff


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