Reduced Global Supply of Wafer-Cleaning Component Spurs Search for Alternatives

PHILLIPSBURG, NJ—June 28, 2000—The explosion and subsequent shutdown earlier this month of the Nisshin Chemical Company plant that produced hydroxylamine is leading to a possible shortage of this widely used wafer-cleaning chemical. Hydroxylamine is used in the removal of photoresist and etch residues in the manufacture of integrated circuits,

By Jeanne Graham


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