Avant! Granted Optical Proximity Correction Patent

FREMONT, Calif.—July 20, 2000—Avant! Corporation was awarded patent number 6,081,658 for their Proximity Correction System for wafer lithography. The invention includes algorithms for fast convolution, the technology used in Avant!'s model based proximity correction and lithography verification tools. The patent also covers methods for the generation of empirical behavior models from process CD data and the simulation of those results.

By pennNET Staff


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