Canon to Introduce Next-Gen Lithography Tools at SEMICON West

Canon's new scanners, the FPA-5000ES3 and FPA-5000AS2, can handle critical layers down to 130nm and 100nm. Both scanners can extend into the low-k lithography area. The scanners have faster reticle changers and job-loading programs. They incorporate SMIF (standard mechanical interface) and allow easier access to the machines, minimizing the total usage of expensive clean room space.

By pennNET Staff



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