Consortia Release English Version of 300mm Performance Metrics for 0.13-micron Processing

PARIS, France—July 28, 2000—Building on their previous cooperation on 300mm wafer manufacturing requirements, International SEMATECH and the Japanese consortium Selete have made available the English language version of its 300mm equipment performance metrics for 0.13 µm technology document.

By pennNET Staff

POST A COMMENT

Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.