Exitech Selects Extraction Systems’ Vaporsorb II Filters

FRANKLIN, MA—June 22, 2000—Exitech Ltd. of Oxford, England has selected Extraction Systems' Vaporsorb II filter technology for its 157 nm exposure tool to conduct advanced optical lithography development. The company will conduct the research in association with lithography equipment suppliers at International SEMATECH.

By Michael Sciannamea


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