Make-up air handler
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Many semiconductor cleanrooms require outside, make-up air to compensate for air usage, leakage or code requirements. This invention is a make-up air handler that controls air temperature, humidity and cleanliness. It includes a direct expansion chiller system, which may be integral to the make-up air handler or remote. It also has a primary cooling, a humidifier and a preheating coil. The direct expansion chiller system includes an air stream cooling coil and an air stream heating coil. The coils use a refrigeration fluid, which is compressed and circulated. Removing moisture, which is condensed from the air stream by a primary cooling coil, controls humidity. Energy removed by the air stream cooling coil is reintroduced to the air stream by the air stream heating coil. The process of removing moisture removes contamination. The process of lowering humidity causes contaminant particles to form and then be removed by a filter.
Patent number: 5,992,161
Date granted: November 30, 1999
Inventors: Michael D. O'Halloran; Wilmar A. Kohne and David R. Gurock, CH2MHill Industrial Design Corp. (Portland, OR)
Cleanroom smock
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The smock filters particles generated by the operator. An air passage within the smock, which is made of a tubular-shaped belt ring, connects the upper and lower parts of the garment. Another tube is inserted inside the belt ring to keep the air passage open when the operator is moving or bending over. A discharge part is installed along the lower part of the smock, near the knee and ankle. It is covered with filter paper, allowing air to pass through, but preventing particles from entering the cleanroom.
Patent number: 6,038,699
Date granted: March 21, 2000
Inventors: Youn-soo Han, Hyeung-ki Kim, Hyun-joon Kim, Seung-un Kim, of Samsung Electronics Co., Ltd. (Suwon, Korea)
Dust-proof fabric
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Known as GORETEX in the clothing industry, the fabric comprises an inner knit layer, an intermediate layer of a moisture-absorbent polyurethane film and an outer layer of high-density woven polyester. Together, the layers trap particles that emanate from one's body. Moisture from the body, however, can pass through the fabric's fine pores. The outer layer contains a first set of spaced apart conductive yarns aligned with one another in the warp direction and a second set of spaced apart conductive yarns aligned in the weft direction. The fabric is treated with a moisture-permeable and waterproof, water-repellent coating or laminate of polyurethane or fluoric resin.
Patent number: 6,040,254
Date granted: March 21, 2000
Inventors: Chang-su Lim, Hyeog-ki Kim, Sue-ryeon Kim, Ilkyoung Kim, of Samsung Electronics Co, Ltd. (Suwon, Korea)
Cleaning method and apparatus
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An aqueous oxidizing acidic cleaning solution or an aqueous oxidizing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with ozone water. The aqueous-reducing acidic-cleaning solution or an aqueous reducing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with hydrogen water. According to the inventors, the cleaning solutions have an effective cleaning power, controlling oxidation-reduction and pH values. By selecting the appropriate cleaning solution according to the types of contaminants adhering to products during each manufacturing step, numerous types of contaminants can be removed by washing with one solution.
Patent number: 6,039,815
Dated granted: March 21, 2000
Inventors: Oh Eui Yeol, Kenichi Mitsumori, Satoshi Miyazawa, of Alps Electronic Co. Ltd. (Japan)
Liquid-proof, breathable fabric
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The breathable, cloth-like, liquid-resistant fabric is made of such non-woven composites as polyvinyl chloride, polyesters and other thermoplastic materials. The fabric can be used as sterilization wrap or to make surgical draping and gowns as well as other garments. The fabric comprises three layers. Top and bottom layers are constructed of spun filaments, while the middle breathable layer is made of micro-porous film.
Patent number: 6,037,281
Date granted: March 14, 2000
Inventors: Michael Peter Mathis, Ann Louise McCormack and Daniel Kenneth Schiffer, of Kimberly-Clark Worldwide Inc. (Neenah, WI)
Antiseptic clean system
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The antiseptic clean system is designed to kill not only drifting microbes, but also germs that have fallen and are adhering to the panels, backsides and gaps of equipment installed in the cleanroom. It was adapted for use in a controlled environment, using cleanroom panels and one or more air conditioners equipped with such photocatalysts as granules of titanium oxide, cadmium cerite, strontium tinanate or a filter impregnated with these compounds. Air flowing through the photocatalysts is then irradiated with ultraviolet light, killing microorganisms and viruses before air is fed back into the cleanroom.
Patent number: 6,048,499
Date granted: April 11, 2000
Inventors: Hirayma Setsube Kabushiki Kaisha, of Kanagawa-Ken (Japan)
Send your inventions
Information on the patents highlighted above was obtained through the U.S. Patent and Trademark Office. Inventors who have been granted patents within the last six months for new cleanroom and contamination technology are encouraged to submit them to CleanRooms magazine for publication. Send a brief description of the invention along with a detailed drawing to Mark A. DeSorbo, associate editor, CleanRooms, 98 Spit Brook Road, Nashua, NH 03062, or e-mail at [email protected].