Yield Dynamics Software Implements 0.12-Micron Design Rules Using Mix-and-Match Lithography

SEMICON WEST '00—July 11, 2000—Yield Dynamics has announced a new software package that promises users the ability to meet the overlay threshold required to achieve 0.12-µm rules using mix-and-match lithographic methods. The company is a supplier of yield management and process control software.

By pennNET Staff

CAMPBELL, Calif.—July 11, 2000—Compaq Computer Corporation and Camstar Systems Inc. announced the release of a computer integrated manufacturing solution for semiconductor test, assembly and packaging.

According to Camstar, the TAP suite solves back-end problems, provides for a paperless operation, offers wireless technologies for input/output convenience, and allows manufacturing data to be shared over the Internet.

Camstar says the product is based on Microsoft’s Windows DNA technologies including Component Object Model, Visual Basic for Applications, ActiveX, and Object Linking and Embedding for Process Control.

The TAP Suite includes components developed by Compaq and its partners, which are integrated through standard bus technologies. Camstar?s Windows NT-based InSite serves as an MES framework component and is included as part of the base system.


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