Photronics Opens Advanced Reticle Characterization Center

AUSTIN, Texas—Aug. 15, 2000—Photronics Inc. has opened its Advanced Reticle Characterization Center (ARCC) at its photomask manufacturing facility in Austin, Texas. The ARCC was established to meet the demand for characterization reticles from semiconductor manufacturers and equipment suppliers working on technologies at and below the 0.13 µm technology node.

By pennNET Staff

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