Residue Remover Provides Alternative to Hydroxylamine in Sub-0.18 Micron Devices

HAYWARD, Calif.—Aug. 18, 2000—With the current global rationing of hydroxylamine, manufacturers are ramping up production of alternatives to the wafer-cleaning chemical. Hydroxylamine is used for the removal of photoresist and etch residues in the manufacture of ICs.

By pennNET Staff


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