Austin, Texas–Oct. 16, 2000–Lithographers attending a recent International SEMATECH Next-Generation Lithography (NGL) Workshop recommended that the global industry narrow the NGL options to two technologies–extreme ultraviolet (EUV) and electron projection lithography (EPL)–for commercialization.

“One of the goals of the NGL Workshop is to build global industry consensus on the NGL options. Today, lithographers from around the world agree that EUV and EPL are the technologies necessary to address the unique application of DRAM and ASIC,” says Gerhard Gross, director of lithography at International SEMATECH. “This decision is particularly important as NGL technology moves out of the R&D arena into the supplier area, and the infrastructure needs to be prepared.”