International SEMATECH works to develop 193nm technology

San Jose, California–International SEMATECH’s Advanced Technology Development Facility recently placed an order with Silicon Valley Group (SVG) for a Micrascan V, 193nm, very high numerical aperture step-and-scan lithography system to support development of 193nm technology for its member companies.

“As the industry’s roadmap accelerates, International SEMATECH is devoting significant effort to understanding and addressing the challenges associated with extending 193nm lithography and etch technology down to the 90nm node,” says Dan Holladay, associate director of International SEMATECH’s Advanced Tool Development Facility. “The Micrascan V tool will be part of this initiative to push 193nm technology further than we have historically thought possible.

The Micrascan V addresses chipmakers’ needs for critical applications at a resolution of 100nm, according to SVG, and is available for 200mm and 300mm semiconductor wafer production.


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