Micronic aquires direct write license for semiconductor applications

Sweden–Micronic Laser Systems AB, a developer of semiconductor and display laser pattern generators for the production of photomasks to worldwide electronic industries, today announced that it has extended its partnership with Fraunhofer Institute for Microelectronic Circuits and Systems (IMS) to include all semiconductor direct write applications based on Micronic’s use of the spatial light modulator (SLM) technology.

Micronic recently announced the first order for Sigma, a photomask pattern generator based on this proprietary SLM technology that was licensed in 1998.

Through this agreement, Micronic has acquired a worldwide exclusive license from Fraunhofer IMS to use its patented devices and methods for direct write lithography to produce semiconductors.

“We have on a long-term basis secured the possibility to broaden our future business to include direct write applications and by that the capability to cover fully the future needs of our semiconductor customers,” says Bert Jeppsson, president and CEO of Micronic Laser Systems AB.


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