Sweden–Micronic Laser Systems AB, a company at the forefront of semiconductor and display laser pattern generators for the production of photomasks to the worldwide electronic industries, today announced an order from Hoya Corp. for its new Micronic Omega6600 laser pattern generation tool.
The Micronic Omega6600 generates state-of-the-art photomasks for semiconductors with feature sizes as small as 0.15 micron. The tool features outstanding critical dimension control, high throughput without data limitations, and the highest resolution available in a laser pattern generator, according to the company. The Micronic Omega6600 also offers a hierarchical data format and scaleable data path, enabling the shortest writing times in the industry.
“Test data indicates that the Micronic Omega6000 Series offers a considerable advantage in write times over competitive systems,” says Bert Jeppsson, president and CEO of Micronic Laser Systems AB. “As this order demonstrates, the market has been very receptive to our pattern generation technology and offering. We believe semiconductor photomask manufacturers will continue to show interest in the Micronic Omega6600 and other systems in the Omega6000 Series.”
In addition to the Omega6000 Series, Micronic is currently developing a next-generation 0.13 micron system, the Sigma, based on its spatial light modulator technology. The company recently announced the first sale of this tool to DuPont Photomasks, Inc., which is scheduled to ship during the second half of 2001.