February 26, 2001–Glouchester, Massachusetts–Varian Semiconductor Equipment Associates, Inc., a supplier of ion implantation systems, today announced that it has received an order for a VIISta 810 ion implanter from UMC, a world-leading foundry services provider headquartered in Hsinchu, Taiwan.

The VIISta 810 system will be installed in UMC’s new 12A 300mm foundry fab in Tainan, which has an expected capacity of 30,000 wafers per month.

“The VIISta 810 ion implanter provides UMC with significant single wafer production advantages, and contributes to our efforts to establish UMC as a leader in foundry technology,” says UMC’s president of business group, Dr. Frank Wen. “The proven track record of our existing VIISta 810 systems at UMC 200mm fabs, coupled with Varian Semiconductor Equipment’s strong service and support, combine to provide us with the performance we need to meet the demands of the expanding 300mm marketplace.”

The VIISta 810 medium current system is designed to provide cost of ownership advantages for 300mm production by achieving wafer throughput at a rate in excess of 230 wafers per hour. In addition, VIISta provides the performance attributes necessary for next- generation ICs. The highly parallel beam, in combination with total incident angle control, allows VIISta to provide optimal threshold voltage (Vt) control and the angular placement accuracy required for halo and pocket implants. Both implant types are considered critical to optimizing sub-130nm IC performance.

“We are very pleased that UMC continues to select the VIISta 810 ion implanter to support their 300mm efforts at their new fab in Tainan,” says Richard A. Aurelio, Varian Semiconductor Equipment’s chairman and chief executive officer . The strong acceptance of our VIISta products in semiconductor markets like Taiwan is critical to our growth and greatly contributes to our position as the industry’s technology leader in ion implantation products.”