DuPont Photomasks and Infineon to develop advanced photomask technology

April 18, 2001 – Round Rock, TX & Munich, Germany – DuPont Photomasks, Inc. and Infineon Technologies have agreed to jointly develop advanced photomask technology to support the production of leading edge memory and logic semiconductor devices.

The two companies plan to work together on joint technology development projects that will include sharing technology know-how and development roadmaps, in addition to the exchange of technical personnel. This will include the development of advanced processes and the improvement of existing ones, for both leading edge binary and phase shift masks.

Inifineon and DuPont Photomasks have also signed a supply agreement whereby DuPont Photomasks will supply Infineon photomasks it outsources, as part of the deal.


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