Meg Villeneuve

ROUND ROCK, TX/BOISE, ID—Dupont Photomasks Inc. (DPI) and Micron Technology Inc. have signed a memo of understanding that states the two companies intend to build an advanced photomask-making development facility.

This agreement is similar to the one already in existence between DPI, AMD, Micron and Motorola. In 1996, all four companies opened the Reticle Technology Center (RTC) in Round Rock, TX. RTC has some 6,500 square feet of cleanroom space and houses advanced photomask production equipment. Each company owns 25 percent of the venture. RTC has approximately 70 employees, and to date the four companies have invested about $75 million.

Under the terms of the tentative agreement, the two companies plan to construct a cleanroom by the end of 2002. The facility would be located near Micron's semiconductor manufacturing campus in Boise, ID.

“The value of mask technology has increased dramatically since the semiconductor industry entered the deep sub-wavelength era at 0.18-micron and below,” notes Peter Kirlin, chief executive officer of DPI. “Our customers are expressing concern about future capability and capacity for advanced mask technology, given rising complexity and costs,” Kirlin adds.

“Our strategy as a world leader in advanced mask technologies is to structure agreements that best fit the needs of our customers. These can take the shape of customer prepayments for capacity, like those we've put in place over the last few quarters, to joint venture agreements, such as the one we anticipate signing with Micron,” Kirlin adds.

Because Motorola makes one type of chip and Micron makes another, the photomasks used are not the same, which is why Micron made the decision to have a separate agreement with DPI.

With the upcoming transition to 300 mm and 0.13-micron design rules, DPI says it expects to see more of these agreements with other companies.