Extraction Wins Multiple Advanced Filtration Orders for 300mm Fabs

September 6, 2001 — FRANKLIN, MA — Extraction Systems recently announced the sale of multiple Extraction 3000 filter systems for 300mm semiconductor fabs in the U.S., Taiwan and Europe.

The Extraction 3000, a next-generation hybrid chemical filter, is designed to protect the resists and optics in advanced deep ultraviolet (DUV) lithography systems. Company officials say the sales illustrate Extraction’s success in supporting the industry’s transition to 300mm manufacturing.

“In the 300mm manufacturing era, lithographers need robust contamination control to protect both resists and optical elements in advanced DUV tools, such as the 193nm systems now coming online,” said Devon Kinkead, president and CEO of Extraction. “The Extraction 3000 is ideal for use in 300mm fabs because it meets this demand for enhanced molecular contamination control while also ensuring optimal cost of ownership for customers.”

The Extraction 3000 couples contamination control solutions with the advanced ability to capture the molecular acids, bases and condensables that threaten the thinner, more sensitive resists and optical components in advanced lithography. Designed for flexibility, the Extraction 3000 incorporates several in-series filters that can be optimized for specific filtration needs.

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