DuPont Electronic, Tokyo Ohka Kogyo announce photoresist license and development agreement

October 3, 2001 – Wilmington, DE & Kawasaki, Japan – DuPont Electronics Technologies and Tokyo Ohka Kogya Co. Ltd. (TOK) have signed a license and development agreement to enable production of photoresists for use in making future generations of semiconductors chips.

Terms of the agreement were not disclosed.

As part of the agreement, TOK becomes the second licensee of DuPont Electronic Technologies’ proprietary fluoropolymer binder resin technology, one of the critical ingredients in leading-edge products for microlithography.

The agreement will allow the companies to move a step closer to commercializing products that extend Moore’s Law, which states that the number of transistors on a computer chip doubles every 12 to 18 months, thus increasing manufacturing productivity and chip performance. Today’s advanced chips have features as small as 130nm. Reducing the feature size to 70nm — which would more than triple the number of transistors on a chip — requires a new form of microlithography at 157nm wavelength. New photoresists are a critical element in developing this technology, the companies said.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.