October 11, 200 1– FRANKLIN, MA — Extraction Systems recently introduced the Extraction 1000, its latest filter system for optics and resist protection in high NA 248nm and 193nm exposure tools. The launch of the Extraction 1000 extends availability of Extraction’s next-generation hybrid chemical filtration technology to virtually all major advanced deep UV lithography systems.

The Extraction 1000 has been configured specifically to treat the make-up air in advanced deep UV lithography tools with internal filters. The Extraction 1000 filter system augments these internal filters by targeting the new and broader range of contaminants threatening optical components and improving protection of thinner, more sensitive resists in high NA 248nm and 193nm lithography.

“Optics contamination has emerged as a leading concern in 193nm lithography, as well as in high NA 248nm processes. The Extraction 1000 allows chipmakers to safeguard optics while also extending the life of their tools’ internal filters,” said Devon Kinkead, president of Extraction. “This capability, particularly when combined with Extraction’s analytical services and support, enables customers to maximize tool uptime and lower cost of ownership.”

Extraction’s next-generation chemical filter technology is already in use on a growing number of advanced deep UV exposure tools worldwide. The filtration technology combines contamination-control solutions for photoresists with the ability to capture the molecular acids, bases and condensables threatening to damage optical elements in high NA 248nm and 193nm lithography tools.

The Extraction 1000 began shipping in the third quarter of 2001.