TEL, Canon: Joint research for F2-laser photolithography tool processes

Dec. 21, 2001 – Tokyo, Japan – Tokyo Electron Limited (TEL) has agreed to join forces with Canon Inc. beginning in FY02 to explore 70nm processes utilizing F2 (157nm wavelength) excimer laser photolithography tools.

The partnership between TEL and Canon will leverage the combined resources of the companies to identify and formulate solutions to the specific challenges and idiosyncrasies borne of processes utilizing the new light source, the companies said.

Through the linking of a CLEAN TRACK ACT 12, a 300mm coater/developer system manufactured by TEL, with a Canon F2 exposure tool, that is to be assembled at Canon’s Utsunomiya Optical Products Operations in Utsunomiya city, Tochigi prefecture, engineers from both companies will initially conduct testing to clarify compatibility and other process issues.

TEL and Canon will also appeal to manufacturers of photoresist for their cooperation and conduct ongoing evaluations and problem-solving initiatives from the standpoint of an end-user, the companies said. Moreover, TEL and Canon are considering forming similar partnerships with other production equipment manufacturers aimed at realizing more comprehensive user support.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.