Veeco, Photronics form relationship in next-generation photomask technology

Jan. 8, 2002 – Woodbury, NY- Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship focused on accelerating the development of advanced manufacturing technologies required to fabricate enhanced reticle and next generation lithography mask technologies.

The initial phase of the relationship includes the purchase of Veeco’s NEXUS Ion Beam Deposition (IBD) Low Defect Density (LDD) system for deposition of critical films by Photronics. The companies have also agreed to share technology roadmaps.


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