ASML, Carl Zeiss confirm 193nm capability

Netherlands & Germany — ASML Holding NV and lens partner Carl Zeiss confirmed the availability of 193nm imaging systems in 2002 to satisfy increased market demand for leading edge 0.10-micron ArF imaging solutions.

“Customers are ordering 193 nm lithography systems and we are shipping them,” said Martin van den Brink, ASML’s Executive VP for Marketing and Technology.

Hermann Gerlinger, Carl Zeiss Semiconductor Manufacturing Technology’s CEO, said, “Our 193 nm lenses have a minimum amount of calcium fluoride, so we are confident about our reliable supply of advanced lenses.”

In 2001, Carl Zeiss successfully established a manufacturing operation in Oberkochen, Germany for production of 193 nm lenses, the critical optical technology for ASML’s highest numerical aperture 193 nm ArF imaging of next generation chips at the 0.10-micron line width.
ASML’s more advanced deep ultra-violet scanners sell for about 10 million euros. Philips Electronics holds a minority stake in ASML.


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