DuPont Photomasks enters development and supply agreements with Cypress

June 17, 2002 – Round Rock, TX – DuPont Photomasks Inc. has signed an agreement with Cypress Semiconductor Corp. to jointly develop advanced photomask technologies supporting the production of high-performance ICs.

The companies have also entered into a separate multiyear supply agreement whereby DuPont Photomasks will provide a significant majority of Cypress’ photomasks for commercial production. As part of this supply deal, Cypress has agreed to pay DuPont Photomasks an undisclosed sum upfront.

The technology agreement calls for the companies to collaborate on the development and qualification of binary and phase-shift photomasks for 130-, 90- and 65nm technology. The work includes development of phase shifting photomasks that meet the requirements of 193nm lithography.


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