AUG. 29–OTTOWA, Canada–MetroPhotonics Inc., a developer of photonic integrated circuits (PICs), has completed of a indium phosphide fabrication facility, a fab that complements existing design and development to produce monolithically integrated optical components.
“Our fab facility optimizes device performance through the combination of design, materials science, and process engineering, this is essential in meeting our goal of developing high quality integrated devices in high volume,” says David Clark, CEO of MetroPhotonics. “MetroPhotonics has strategically aligned with outside partners for packaging and epitaxial material supply.”
MetroPhotonics reportedly has achieved successful results on integrated devices fabricated within the new facility, through of high resolution lithography with high density plasma etching to produce ultra high smoothness, optically perfect reflecting surfaces for its compact echelle grating DWDM solutions. These coupled with MetroPhotonics integrated attenuator and photodetector elements allow for replacing discrete / hybrid in-line assemblies with a monolithic device.
According to officials, MetroPhotonics is now poised to execute a fast and secure ramp into production following prototype development. New cleanroom facilities at MetroPhotonics total 10,000 square feet with ISO Class 5,6, and 7 suites.
“We are presently set up for 3-inch production, but have the capability to easily convert to 4-inch as and when our business plan requires it,” says Dr. Bedwyr Humphreys, director of device fabrication at MetroPhotonics. “In fact, all tools are capable of conversion to 6-inch, so with the fast pace of development in InP substrates and EPI growth techniques our facilities are also future proofed.”