Nov. 19, 2002 – Leuven, Belgium – Japan-based Matsushita Electric Industrial Co. Ltd. and independent electronics R&D center IMEC will collaborate on the development and implementation of high-k gate stacks for sub-65nm devices, a process recognized by the international technology roadmap for semiconductors (ITRS) as one of the most difficult roadblocks for the industry to overcome.
As part of the contract, a Matsushita researcher will join IMEC’s research team. The agreement is considered the start of a long-term partnership between the two organizations.
IMEC is also collaborating on the development of high-k dielectrics with International Sematech and Hitachi.