Matsushita joins IMEC’s high-k research team

Nov. 19, 2002 – Leuven, Belgium – Japan-based Matsushita Electric Industrial Co. Ltd. and independent electronics R&D center IMEC will collaborate on the development and implementation of high-k gate stacks for sub-65nm devices, a process recognized by the international technology roadmap for semiconductors (ITRS) as one of the most difficult roadblocks for the industry to overcome.

As part of the contract, a Matsushita researcher will join IMEC’s research team. The agreement is considered the start of a long-term partnership between the two organizations.

IMEC is also collaborating on the development of high-k dielectrics with International Sematech and Hitachi.


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