Jan. 7, 2003 – Danvers, MA – Ibis Technology Corp., a provider of SIMOX-SOI implantation equipment and SIMOX-SOI wafers, has signed a joint development agreement with IBM.
The objective of the agreement is to develop an enhanced, modified low-dose (MLD) process for the manufacture of SIMOX-SOI wafers.
The joint development work will be conducted at both Ibis and IBM.