Jan. 21, 2003 — SUSS MicroTec, a Munich, Germany, supplier of production and process technology for the semiconductor industry, will install a lithography line at the National Nano Device Laboratories (NDL) in Taiwan, according to a company news release.
The line consists of an MA150 production mask aligner and ACS200 coating cluster optimized for thin and thick resist MEMS applications. The line will open to customers next month for demonstration and evaluation.