NanoInk debuts nanolithography tool

May 2, 2003 — NanoInk Inc., a Chicago developer of dip pen nanolithography tools, unveiled its entry-level DPNWriter system. The device is designed to let researchers build patterns, layers and structures at resolutions less than 15 nanometers with spacing as close as 5 nanometers.

The system is now available and includes three days of on-site installation and training. Price was not disclosed. NanoInk said it also offers ongoing applications development support on a contract basis.


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